Obtaining of TiSiCN coatings by anodic evaporation of titanium and decomposition of hexamethyldisilazane in a low-pressure arc discharge
نویسندگان
چکیده
The method of TiSiCN-coatings deposition by anodic evaporation Ti and decomposition an organosilicon precursor (hexamethyldisilazane) in a low-pressure (∼1 mTorr) nitrogen-argon arc discharge with self-heated hollow cathode is investigated. plasma composition was analyzed optical emission spectroscopy. TiSiCN coatings thickness up to 10 microns hardness 30 GPa were obtained 1.5 hours at temperature 400°C.
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ژورنال
عنوان ژورنال: Journal of physics
سال: 2021
ISSN: ['0022-3700', '1747-3721', '0368-3508', '1747-3713']
DOI: https://doi.org/10.1088/1742-6596/1954/1/012032